One of the main challenges is the relatively low etching rate compared to conventional techniques, which can limit throughput and productivity. Researchers are working on developing faster ALE ...

It's worth noting that wet etching differs from dry etching techniques, such as reactive ion etching (RIE), which use plasma to remove material from a substrate. While both techniques are used in ...

We have arrived at the age where atomic level precision in the fabrication of semiconductor devices is needed to keep improving PPA. Thus, advanced film fabrication techniques that provide precise ...